• In contrast to other solutions used previously etching, these products do not contain chlorinated hydrocarbons.
  • Optimum temperature of the etching solution between 25 and 35 ° C.
  • Short times etching. Reduces polymer build-up inside processors.
  • Recommended drying time, 3 hours at 60 ° C (not to exceed 65).
  • Valid for any processing unit, as well for closed recirculation units.
  • The distillable product is easily used with conventional vacuum distillation equipment.
  • After distillation is not necessary a balancing. It is recommended to mix with new product at least 20%.
  • The SOLVENT LO has a low odor.
  • When used properly, in accordance with its intended purpose, the SOLVENT LO presents minimal risk to human health and the environment.

60 ºC







Available packaging

200L, 1000L

Instructions for use

It is recommended to perform preliminary etching tests:
  • Type photopolymer.
  • Process temperature.
  • Processing time.
  • Brush pressure.
The regeneration recommended for the washing solution is approx. 10 to 15 liters per square meter of surface and mm thick of the plate. The target for most plate processors 3.5-4% maximum solids.

Do you have any question about the product?Do you need expert help?

Privacy Preference Center

Necesarias para la web

gdpr - para gestionar las cookies de la web
JSESSIONID - para gestionar las sesiones de los usuarios logueados en la web
wpSGCachePypass - para gestionar la caché
_icl_current_language - para gestionar los idiomas de la web

gdpr, JSESSIONID, wpSGCachePypass, gawp, _icl_current_language



cookies de Google Analytics usadas para distinguir a los diferentes usuarios

_ga, _gid


La cookie '__cfduid' es establecida por el servicio de CloudFlare para identificar tráfico web de confianza.